ADC : Analog-to-Digital Convertor
AES : Auger Electron Spectroscopy
AFM : Atomic Force Microscope
AGC : Automatic Gain Control
ARPA : Advanced Research Projects Agency (U.S. Govt.)
ATM : Asynchronous Transfer Mode; also, Atmosphere (1 ATM = 760 mmHg)
CAD : Computer-Aided Design
CAE : Computer-Aided Engineering
CAM : Computer-Aided Manufacturing
CCD : Charge-Coupled Device
CEBOT : Cellular Robot
CMOS : Complementary Metal-Oxide Semiconductor
CNC : Computerized Numerical Control
CVD : Chemical Vapor Deposition
DEMA : Distributed Electromechanical Actuator
DIP : Dual In-line Package
DP : Differential Pressure
ECR : Electron Cyclotron Resonance
EDM : Electro-Discharge Machining
EM : Electro-Magnetic
EPROM : Electronically (Re)Programmable Read-Only Memory
ETL : Electro-Technical Laboratory (MITI)
FEM : Finite Element Method
FIB : Focused Ion Beam
FL : Fuzzy Logic
FPD : Flat Panel Display
HF : Hydrofluoric Acid
HVAC : Heating, Ventilation, and Air Conditioning
IC : Integrated Circuit
IDMTM : Information Driven Machines that Move
IR : Infra-Red
ISFET : Ion-Sensitive Field Effect Transistor
IWD : Integrated Waveguides by Compositional Disordering
KOH-Based : Potassium Hydroxide-Based
LAN : Local Area Network LIGA : in German: Lithographie Galvanoformung Abformung (a process based on lithography, electroplating, and molding)
MCM : Multi-Chip Module
MCNC : Microelectronics Center of North Carolina
MEL : Mechanical Engineering Laboratory (MITI)
MEMCAD : Microelectromechanical Computer-Aided Design (Design program under development at the Massachusetts Institute of Technology)
MEMS : Microelectromechanical Systems
MITI : Ministry of International Trade and Industry (Japan)
MLE : Molecular Layer Epitaxy
MMC : Micromachine Center (Japan)
MOS : Metal Oxide Semiconductor
MOSIS : A U.S. integrated circuit foundry service
NEDO : New Energy and Industrial Technology Development Organization (Japan)
NETD : Noise Equivalent Temperature Difference
NIH : National Institutes of Health
NMOS : N-Channel Metal Oxide Semiconductor (a transistor technology)
NRLM : National Research Laboratory for Metrology
OD : Outer Diameter
PAT : Packaging, Assembly and Testing
pCO(¯2) : Partial pressure of Carbon dioxide
PGA : Pin Grid Array
Piezoactuator : An actuator typically producing a force or displacement in response to an electrical input signal
PLZT : Variation of PZT
PMMA : Poly Methyl Methacrylate (an electron-beam and X-ray sensitive resist)
PVDF : Polyvinylidene Fluoride
PZT : Lead Zirconate Titanate
QMS : Quadrapole Mass Spectroscopy
RCAST : Research Center for Advanced Science and Technology
RDT : Rotary Displacement Transducer
RF : Radio Frequency
RHEED : Reflection High Energy Electron Diffraction
RIE : Reactive Ion Etch
SAS : Sensors, Actuators, and Subsystems
SEM : Scanning Electron Microscope
SIMS : Secondary Ion Mass Spectroscopy
SLR : Single-Lens Reflex (camera)
SMA : Shaped Memory Alloy
SOI : Silicon-on-Insulator
SRAM : Static Random Access Memory
STM : Scanning Tunneling Microscope
TFT : Thin Film Transistor
TIG : Tungsten Inert Gas (a type of welding)
ULSI : Ultra Large-Scale Integration
UV : Ultraviolet
VLSI : Very Large-Scale Integration
VSM : Very Small Machines
WCVD : Tungsten Chemical Vapor Deposition
WEDG : Wire Electric Discharge Grinding
XPS : X-ray Photo-Spectroscopy