ATOMICALLY PRECISE PROCESSING

The author had the privilege of visiting Professor Esashi's laboratory at Tohoku University several years ago and again during this JTEC study. The changes at Tohoku University are remarkable. There is a new clean room and lots of sophisticated equipment that one needs for atomically precise rather than lithographic processing. The fact that Professor Esashi is an Associate Director of the Semiconductor Research Institute and has access to work in atomic and molecular epitaxy that originated with Professor Nishizawa, currently the President of Tohoku University, hints at a shift in emphasis towards nanomechanics. This change makes sense at Tohoku University. It also makes sense from a national perspective if the attitude is that Japan is behind in silicon micromechanics and in X-ray assisted processing. Work on precision gas valves that is in progress at several companies would yield improved control over gas sources for sophisticated epitaxial growth techniques, an important nanomechanical technology. A similar comment applies to several activities in Japan on miniature focused ion beam sources, which fit well into the concept of nano- rather than micromechanics. These devices, which are viewed as important tools for miniature, energy-efficient factories, can only support nanospace.

REFERENCES

Clemens, J., and R. Hill, ed. 1991. JTEC Panel Report on X-ray Lithography in Japan. PB92-100205, Springfield, VA:NTIS.

Furuya, A., F. Shimokawa, T. Matsuura, and R. Sawada. 1993. "Micro-grid Fabrication of Fluorinated Polyimide by Using Controlled Reactive Ion Etching (MC-RIE)." In Proc. of IEEE-MEMS Conference. Pp. 59-64.

Guckel, H., K.J. Skrobis, T.R. Christenson, and J. Klein. 1994. "Micromechanics for Actuators via Deep X-ray Lithography." Paper presented at SPIE's 1994 Symposium on Microlithography. Paper 2194-09. February. San Jose, CA.

Hirano, T., T. Furuhata, and H. Fujita. 1993. "Dry Released Nickel Micromotors and their Frictional Characteristics." In Proceedings of the 7th International Conference on Solid-State Sensors and Actuators. Pp. 80-83.

Murakami, K., Y. Wakabayashi, K. Minami, and M. Esashi. 1993. "Cryogenic Dry Etching for High Aspect Ratio Microstructures." In Proceedings of IEEE-MEMS Conference. Pp. 65-70.

Wise, K.D. 1994. "Sensor-Circuit Integration and System Partitioning." In JTEC Panel Report on Microelectromechanical Systems in Japan. K. Wise, ed. Springfield, VA:NTIS.

Yamaguchi, M., S. Kawamura, K. Minami, and M. Esashi. 1993. "Distributed Electrostatic Microactuator." In Proceedings of IEEE-MEMS Conference.


Published: September 1994; WTEC Hyper-Librarian