1.1 Major Elements of Color Active MatrixLCDs
1.2 World Wide Display Sales
1.3 1990 Market Share

2.1 Illustration of a Retardation Film
2.2 Change of Retardation vs. View AngleControl
2.3 Color Filter Formation Methods
2.4 Stability of a Polarizing Film UnderDevelopment

3.1 Process For a-Si TFT Array
3.2 Process Layout
3.3 Plant Layout
3.4 Plant Layout
3.5 ILV-9300 P-CVD System

3.6 Vertical Double-Sided DepositionChamber
3.7 Sputtering System
3.8 Process Line
3.9 Photo Process Line
3.10 Rinse/Wet Processing Line
3.11 General Image of Layout
3.12 Packaging Configurations in LCDs
3.13 Various IC Bonding Methods

4.1 4.1 Typical Twisted Nematic LCD
4.2 4.2 LCD Transmission As a Function of AppliedVoltage

5.1 Simple TFT Active-Matrix Array
5.2 TFT Leakage and Drive Characteristics
5.3 Progress of Displays in Japan
5.4 Production and Investment Efficiency
5.5 Price Elasticity of Color Kinescopes andLiquid Crystals
5.6 World Demand for Color Kinescopes - LiquidCrystal Modules
5.7 Power Consumption Reduction in Displays
5.8 CTV - PC - WS Market
5.9 Probability of Adoption of TFT LiquidCrystals by the PC/WS Market
5.10 Probability of Adoption of TFT LiquidCrystals by the 1995 PC/WS Market
5.11 Adoption Probability of TFT Liquid Crystalsby PC/WS Market
5.12 Cost Comparison of Color Kinescopes andLiquid Crystal (Indirect Costs)
5.13 Display of the 21st Century
5.14 Amorphous Silicon Active Matrix FabricationProcess
5.15 Size Limitation of an Active MatrixDisplay
5.16 MIM Fabrication
5.17 Poly-Silicon Active Matrix FabricationProcess

6.1 Optical Path

[Table of Contents]

Published: June 1992; WTECHyper-Librarian